MELI-2000 (Micro Etching Laser Induced)

We Specialise in High Precision laser etch Solution

Focus for   failure analysis and sample preparation

The MELI-2000 enables laser-based sample preparation   for a variety of specimen preparation applications. With its   integrated ultrashort pulsed laser source, it complements existing   approaches to sample preparation such as ion beam processing. MELI-2000 is suited to ablate metals, semiconductors, ceramics, polymers, and compound materials. It creates new vistas for material and process development as well as failure analysis.

• Free-form sample preparation

• Provides samples with micron-level precision

• Sophisticated workflows for automated tasks

• Reduces time-to-sample significantly

• Lower cost per sample

为高通量3D分析和样品制备量身打造，

提升您的聚焦离子束（FIB）样品制备效率

得益于智能激光消除和3D扫描技术，移除材料相比以往实验快40%以上。

特点：

• 较大的面积/纵深

• 快速高精度

• 可重复性

x• 多功能

• 操作简单

• 高自动化

• 进程可视可控化

• 与多种工艺兼容

• 合理的成本消耗

• 友好的样品属性

•SEM分析

•TEM分析

•3D重构分析

•电路连接与芯片级别的结构诊断

•诊断学应用

•加速制样流程

•激光诱导式减薄、箱式减薄、线切割、表面处理等应用。